Nanoscale patterning is a fundamental step in implementing MOFs in miniaturized solid-state devices. We developed a resist-free process to pattern MOFs via direct X-ray (DXRL) and electron-beam (EBL) lithography. This process avoids etching damage and contamination yet leaves the porosity and crystallinity of the patterned MOFs intact. Moreover, the resulting high-quality patterns have an excellent sub-50-nm resolution, approaching the mesoporous regime. To demonstrate some of the capabilities of this method, we fabricated a photonic sensor that responds to organic vapors.
This research was carried out in collaboration with VUB (Belgium), TU Munich (Germany), TU Graz (Austria), and Elettra Sincrotrone Trieste (Italy). This work, published in Nature Materials, will speed up the integration of MOFs into microchips.
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Following the proof-of-concept work on the chemical vapor deposition of metal-organic frameworks (MOF-CVD) and a demonstration of its potential in microelectronics integration, we now present the fully cleanroom-compatible process for the deposition of large-area MOFs. Led by Alex, the output of this international collaboration was recently published in Chemistry of Materials. In this work, we thoroughly discussed the optimization process and unraveled the mechanism of MOF-CVD which led to a process chart—a guiding paradigm in developing future MOF-CVD formulations.
This marks an important milestone in bringing MOFs a step closer to the industrial-scale microfabrication lines and the production of MOF-based devices.