Chemical vapor deposition of metal-organic frameworks (MOF-CVD) will facilitate the integration of porous and crystalline coatings in electronic devices. In the two-step MOF-CVD process, a precursor layer is first deposited and subsequently converted to MOF through exposure to linker vapor.
This work discusses the impact of different metal oxide and metalcone layers as precursors for the MOF-CVD of zeolitic imidazolate framework ZIF-8 films. These precursor layers were prepared by atomic and molecular layer deposition, physical vapor deposition; the effect of treatments such as humidification and annealing of the precursors were also tested.
Alex was awarded his PhD after successfully completing the public defense of his thesis entitled "Metal-organic frameworks by vapor deposition processes".
His PhD is a joint degree from the KU Leuven (PhD in Bioscience Engineering) and the VUB, Vrije Universiteit Brussel (Doctor of Engineering Sciences, with the highest distinction). The team is looking forward to working with Alex on several planned outreach activities on science communication.
Again, congratulations Alex!
Nanoscale patterning is a fundamental step in implementing MOFs in miniaturized solid-state devices. We developed a resist-free process to pattern MOFs via direct X-ray (DXRL) and electron-beam (EBL) lithography. This process avoids etching damage and contamination yet leaves the porosity and crystallinity of the patterned MOFs intact. Moreover, the resulting high-quality patterns have an excellent sub-50-nm resolution, approaching the mesoporous regime. To demonstrate some of the capabilities of this method, we fabricated a photonic sensor that responds to organic vapors.
This research was carried out in collaboration with VUB (Belgium), TU Munich (Germany), TU Graz (Austria), and Elettra Sincrotrone Trieste (Italy). This work, published in Nature Materials, will speed up the integration of MOFs into microchips.
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Following the proof-of-concept work on the chemical vapor deposition of metal-organic frameworks (MOF-CVD) and a demonstration of its potential in microelectronics integration, we now present the fully cleanroom-compatible process for the deposition of large-area MOFs. Led by Alex, the output of this international collaboration was recently published in Chemistry of Materials. In this work, we thoroughly discussed the optimization process and unraveled the mechanism of MOF-CVD which led to a process chart—a guiding paradigm in developing future MOF-CVD formulations.
This marks an important milestone in bringing MOFs a step closer to the industrial-scale microfabrication lines and the production of MOF-based devices.