Mikhail wins a spot in the list of candidates vying for the ALD student awards at the 20th International Conference on Atomic Layer Deposition (ALD2020).
In collaboration with imec and Heidelberg Instruments Nano in Switzerland, Mikhail will present his work entitled, "Resistless Lithography Based on Local Surface Modification of Halogenated Amorphous Carbon".
The student awards have been established to recognize outstanding research performed by a graduate student in areas of interest to Atomic Layer Deposition. The ALD student finalists have been chosen from the submitted student abstracts and will receive a $500 award upon completing the competition. Competition for the award requires an oral presentation during the ALD 2020 Virtual Meeting. The best presenter will win $1,000 cash prize and a certificate.
Congrats, Mikhail, and all the best for the finals!
More info: https://ald2020.avs.org/awards/