ChemComm paper on Cu-based MOF-CVD
Together with the groups of Paolo Falcaro and Roland Resel (TU Graz, Austria), we expanded the scope of materials which can be deposited as thin films by MOF-CVD to Cu-MOFs. The orientation of the films was investigated by synchrotron measurements at the European Synchrotron Radiation Facility. Our study was accepted for publication in ChemComm.
Following a typical MOF-CVD protocol thin Cu and CuO precursor layers were deposited from the vapor phase and subsequently reacted with vaporized 1,4-benzenedicarboxylic acid (H2BDC) or trans-1,4-cyclohexanedicarboxylic acid (H2CDC). The resulting CuBDC and CuCDC films have an out-of-plane orientation with pore channels perpendicular to the surface, hence readily accessible for guest molecules as proven by QCM measurements.