MOF-CVD precursor paper @Dalton Transactions

Chemical vapor deposition of metal-organic frameworks (MOF-CVD) will facilitate the integration of porous and crystalline coatings in electronic devices. In the two-step MOF-CVD process, a precursor layer is first deposited and subsequently converted to MOF through exposure to linker vapor.

This work discusses the impact of different metal oxide and metalcone layers as precursors for the MOF-CVD of zeolitic imidazolate framework ZIF-8 films. These precursor layers were prepared by atomic and molecular layer deposition, physical vapor deposition; the effect of treatments such as humidification and annealing of the precursors were also tested.

Check out the paper on the Publications page or through the link to the publisher's page (Dalton Transactions).