ChemComm paper on Cu-based MOF-CVD

Together with the groups of Prof. Paolo Falcaro and Prof. Roland Resel (TU Graz, Austria), we expanded the scope of materials for MOF-CVD with Cu-MOF thin films. The orientation (crystallinity) was investigated by synchrotron measurements at the European Synchrotron Radiation Facility. Our study was accepted for publication in ChemComm.

Following a typical MOF-CVD protocol thin Cu and CuO precursor layers were deposited from the vapor phase and subsequently reacted with vaporized 1,4-benzenedicarboxylic acid (H2BDC) or trans-1,4-cyclohexanedicarboxylic acid (H2CDC). The resulting CuBDC and CuCDC films have an out-of-plane orientation with pore channels perpendicular to the surface, hence readily accessible for guest molecules as shown by QCM measurements.